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EQUIPMENT SPECIFICATIONS
Canon Stepper MPA-500FAb
| 1:1 Mirror Projection Aligner |
| Auto Feeder: |
Single, cassette to cassette, backside wafer handling |
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| Wafer Size: |
5”, 4” and 3” |
| Mask size: |
6”, 5” and 4” |
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| Illumination: |
2KW High Pressure Mercury Lamp
Intensity: > 600mW / cm2 (6 inch wafer)
Illumination Uniformity: + 3%
Aperture sizes: 1.0, 1.1,
Exposure Uniformity: + 3%
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| Resolution: |
1.5μm (positive resist)
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| Depth of Focus: |
> + 6μm (line width 1.5μm)
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| Magnification: |
< 0.4μm (3sigma)
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| Distortion: |
3sigma < 0.5um
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| Scanning Accuracy: |
< + 1.5%
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| Auto Alignment Accuracy: |
LBS AA 3sigma < 0.6um (HeNe laser beam scan)
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| Throughput (6”wafer): |
> 83 wfs/h (first mask mode)
> 72 wfs/h (LBS AA mode)
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